1·The results show that the photoresist which contains cinnamyl group exhibited an excellent thermal stability and adequate photosensitive properties.
研究结果表明，这种含肉桂基的光刻胶具有优良的耐热性与适宜的光敏特性。
2·The results show that the technology of melting photoresist is a simple and practical technology of fabricating microlens array.
结果表明，光刻胶热熔技术是一种简单、实用的微透镜阵列制作技术。
3·Where the UV light shines through, it chemically weakens the photoresist, leaving a pattern on the surface of the silicon.
在紫外光照射穿透的地方，光刻胶的化学特性会被削弱，使硅晶片表面留下图案。
4·Then the wafer is sent through a chemical bath that etches trenches into the exposed substrate, while leaving the areas covered by the photoresist untouched.
接着，硅晶片会被送入一个化学浴室，在暴露在外的硅衬底上蚀刻沟槽，同时光刻胶覆盖的区域不会受到任何影响。
5·According to the analysis of the photoresist process that got organic initiator conditions, nanometer of physical map was obtained.
根据对有机引发剂条件下的光刻胶过程的分析得出了纳米级实体图。